SPIE Advanced Lithography 2012
February 14 - 15, 2012
圣何塞 CA , 美国
SPIE Advanced Lithography 2012 Exhibition is a highly regarded, 50-company exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.
See the latest technology in advanced lithography:
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging
Exhibition Dates and Hours:
Tuesday 14 February | 10:00 am to 5:00 pm
Wednesday 15 February | 10:00 am to 4:00 pm
See the latest technology in advanced lithography:
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging
Exhibition Dates and Hours:
Tuesday 14 February | 10:00 am to 5:00 pm
Wednesday 15 February | 10:00 am to 4:00 pm
场馆
Location: San Jose Convention Center
As the flagship of San Joses convention facilities, the San Jose Convention Center will be the focal point of your meeting, a hub of activity and excitement where your attendees will converge. From..
(408) 295-9600
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