April 16 - 18, 2013    Yokohama , Japon
Photomask Japan 2013 is the 20th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics
• Materials of and for Photomasks
• Fabrication Process Steps and Equipments for Photomasks
• (process and equipments for developing, etching, cleaning etc.)
• Photomask Writing Tools and Technologies
• Metrology Tools and Technologies
• Inspection Tools and Technologies
• Repairing Tools and Technologies
• Technologies and infrastructures for EUVL masks
• Mask Data Preparations, EDA and DFM
• Photomasks with RET: PSM, OPC, SMO and Multiple Patterning
• Photomask-relating Lithography Technologies
• NIL and masks for Patterned Media
• Photomasks for FPD
• DSA (Directed Self-Assembly)
• Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.

Lieux de Rendez-Vous

Location: Pacifico Yokohama
PACIFICO YOKOHAMA, a world-class convention center, connects people all over the world Since the global human issues we are focusing on today include environment and peace, the role of..
Contact 1-1-1, Minato Mirai, Nishi-ku, , Japan Yokohama , Japan
+81-45-221-2121

Evénements Liés

Photomask Japan April 16 - 18, 2013
PHOTOMASK JAPAN 15 April, 2012
PHOTOMASK JAPAN April 13 - 15, 2011
PHOTOMASK JAPAN April 13 - 15, 2010
PHOTOMASK JAPAN April 8 - 10, 2009