Exhibition · Yokohama, Japan

PHOTOMASK JAPAN 2011

Electrical Engineering · Optics, Precision Mechanics, Laser · Stones, Minerals

Official website
Dates13–15 Apr 2011This edition has ended
VenuePacifico YokohamaYokohama, Japan
RunningSince 2009Annual · 7 editions on record
Last checked12 Nov 2026Organiser website checked
This is the 2011 edition. It has ended. See Photomask Japan's current page for the next dates.

Key numbers

Editions on record
7first in 2009

About Photomask Japan

Photomask Japan is the international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

From our listing of this edition. Details may have changed since.

Editions

YearDatesWhereExhibitorsVisitors
201516–18 Apr 2015Pacifico Yokohama
Yokohama, Japan
——
201415–17 Apr 2014Pacifico Yokohama
Yokohama, Japan
——
201316–18 Apr 2013Pacifico Yokohama
Yokohama, Japan
——
201215 Apr 2012Pacifico Yokohama
Yokohama, Japan
——
201113–15 Apr 2011Pacifico Yokohama
Yokohama, Japan
——
201013–15 Apr 2010Pacifico Yokohama
Yokohama, Japan
——
20098–10 Apr 2009Pacifico Yokohama
Yokohama, Japan
——

Past editions from the bvents archive (2008–2019) and organiser figures where they were published.

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