Conference · Houston, Texas

International Conference on IC Design and Technology - ICICDT 2012

Graphic Arts · Science · Software

Official website
Dates30 May – 1 Jun 2012This edition has ended
VenueFreescale SemiconductorHouston, Texas
RunningSince 2009Annual · 6 editions on record
Last checked12 Nov 2026Its website has moved
This is the 2012 edition. It has ended. See International Conference on IC Design and Technology - ICICDT's current page for the next dates.

Key numbers

Editions on record
6first in 2009

About International Conference on IC Design and Technology - ICICDT

Global Forum for Interaction and Collaboration:

The International Conference on IC Design and Technology is the global forum for interaction and collaboration of IC design and technology for "accelerating product time-to-market". Close collaboration of the multi-discipline technical fields - design/device/process - accelerates the implementation of new designs and new technologies into manufacturing.

IC Trends:

IC industry trends toward specializing system design and manufacturing outsourcing - such as fabless design house, wafer foundry, design automation tool/software house, and semiconductor processing tool supplier - created the needs for individuals with multi-discipline technical skills for collaborations. Furthermore, advanced IC technology no longer can offer the same level of control over many parameters that have direct adverse impact on circuit behavior. New IC designs also push the limit of technology, and in some cases require specific fine-tuning of certain process modules in manufacturing. Thus the traditionally separated communities of design and technology - design/device/process - are increasingly intertwined. Issues that require close interaction and collaboration for trade-off and optimization by all design/device/process fields are addressed in this conference. They are:

Design/device/process optimizations and trade-off for leakage current, power consumption, & noise issues in mixed-signals, large scale IC devices, or design re-use.

Incorporation of new materials (i.e. dual gate, multi-material active layers, etc.) in IC cell library and design of advanced transistor structures (i.e. Double Gate FDSOI, FinFET, etc.).

Implementation of IC design and manufacturing process of new device structures (i.e. PDSOI, FDSOI, MRAM, etc.).

From our listing of this edition. Details may have changed since.

Editions

YearDatesWhereExhibitorsVisitors
201428–30 May 2014AMD Austin Lone Star Campus
Austin, Texas
——
201329–31 May 2013Freescale Semiconductor
Houston, Texas
——
201230 May – 1 Jun 2012Freescale Semiconductor
Houston, Texas
——
20112–4 May 2011Ambassador Hotel
Hsinchu, Taiwan
——
20102–4 Jun 2010Minatec
NO CITY, France
——
200918–20 May 2009Freescale Semiconductor
Houston, Texas
——

Past editions from the bvents archive (2008–2019) and organiser figures where they were published.

Industries