Expo and conference · San Jose, California
SPIE Advanced Lithography 2012
Engineering · Measurement, Instrumentation · Semiconductor
Key numbers
- Editions on record
- 4first in 2008
About SPIE Advanced Lithography
SPIE Advanced Lithography 2012 Exhibition is a highly regarded, 50-company exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.
See the latest technology in advanced lithography:
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging
Exhibition Dates and Hours:
Tuesday 14 February | 10:00 am to 5:00 pm
Wednesday 15 February | 10:00 am to 4:00 pm
From our listing of this edition. Details may have changed since.
Editions
| Year | Dates | Where | Exhibitors | Visitors |
|---|---|---|---|---|
| 2015 | 24–28 Feb 2015 | San Jose Convention Center San Jose, California | — | — |
| 2013 | 24–28 Feb 2013 | San Jose Convention Center San Jose, California | — | — |
| 2012 | 14–15 Feb 2012 | San Jose Convention Center San Jose, California | — | — |
| 2008 | 26–27 Feb 2008 | San Jose Convention Center San Jose, California | — | — |
Past editions from the bvents archive (2008–2019) and organiser figures where they were published.