SPIE Advanced Lithography 2013

SPIE Advanced Lithography 2013 is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

SPIE Advanced Lithography draws more than 4,000 attendees and about 50 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Extreme Ultraviolet (EUV) Lithography

+ Alternative Lithographic Technologies

+ Metrology, Inspection, and Process Control for Microlithography

+ Advances in Resist Materials and Processing Technology

+ Optical Microlithography

+ Design for Manufacturability through Design-Process Integration

Courses: Advanced Lithography 2013 will include 12 half- and full-day technical short courses on topics ranging from lithography fundamentals to emerging approaches including Directed Self Assembly (DSA) and EUV lithography. 2013 course lists and descriptions will be available September 2012.

SPIE Advanced Lithography 2013 venue will be at San Jose Convention Center and San Jose Marriott San Jose,
California,
USA

Partial lists of list of exhibitors for 2013: Abeam Technologies ,ASML,Benchmark Technologies,Brewer Science Inc.,Brion Technologies,arl Zeiss SMS GmbH,Donaldson Company,Inc.,Energetiq Technology, Inc.,FUJIFILM Electronic Materials,Gudeng Precision Industrial Co., Ltd. and many more.