Conference · Costa Mesa, California
SPIE Photomask Technology 2011
Electronics · Semiconductor · Engineering
Dates19–22 Sep 2011This edition has ended
VenueMonterey Conference CenterCosta Mesa, California · where the 2010 edition was; venue not yet confirmed
RunningSince 2010Annual · 6 editions on record
Last checked12 Nov 2026Organiser website checked
This is the 2011 edition. It has ended. See SPIE Photomask Technology's current page for the next dates.
Key numbers
- Editions on record
- 6first in 2010
About SPIE Photomask Technology
Exhibit at SPIE Photomask ,
20–21 September 2011, Monterey Conference Center, California, USA, the
most recognized photomask exhibition for showcasing the work of the
mask-making industry.
From our listing of this edition. Details may have changed since.
Editions
| Year | Dates | Where | Exhibitors | Visitors |
|---|---|---|---|---|
| 2015 | 29 Sep – 1 Oct 2015 | Monterey Conference Center Costa Mesa, California | — | — |
| 2014 | 16–18 Sep 2014 | Monterey Conference Center Costa Mesa, California | — | — |
| 2013 | 10–12 Sep 2013 | Monterey Conference Center Costa Mesa, California | — | — |
| 2012 | 11–13 Sep 2012 | Monterey Conference Center Costa Mesa, California | — | — |
| 2011 | 19–22 Sep 2011 | Monterey Conference Center Costa Mesa, California | — | — |
| 2010 | 13–16 Sep 2010 | Monterey Conference Center Costa Mesa, California | — | — |
Past editions from the bvents archive (2008–2019) and organiser figures where they were published.