Conference · Costa Mesa, California

SPIE Photomask Technology

Electronics · Semiconductor · Engineering

Official website
Next editionNot confirmedLast edition we have: 29 Sep – 1 Oct 2015
Last venueMonterey Conference CenterCosta Mesa, California
RunningSince 2010Annual · 6 editions on record
Last checked12 Nov 2026Organiser website checked
We haven't confirmed the next dates yet. The last edition in our records was 29 Sep – 1 Oct 2015 at Monterey Conference Center. Check the organiser's site: spie.org. Are you the organiser? Correct this listing.

Key numbers

Editions on record
6first in 2010

About SPIE Photomask Technology

The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications.

Mask Making

+ Mask data preparation

+ Substrates and materials

+ Patterning tools and processes

+ Resist and resist processing

+ Etch techniques

+ Metrology

+ Inspection

+ Repair

+ Cleaning, contamination, and haze

+ Simulation of mask making

9-inch Glass

+ Impact of 450mm wafers on reticle and infrastructure

+ Tool developments to support larger blanks

+ Material developments

Mask Business

+ EUV mask making

+ EUV mask inspection and repair

+ EUV mask infrastructure

+ EUV mask application

+ Nanoimprint mask making

+ Nanoimprint mask application

+ Pixelated masks

+ Alternative mask technologies

+ Grey-scale masks

+ Direct-write, ML²

From our listing of this edition. Details may have changed since.

Editions

YearDatesWhereExhibitorsVisitors
201529 Sep – 1 Oct 2015Monterey Conference Center
Costa Mesa, California
——
201416–18 Sep 2014Monterey Conference Center
Costa Mesa, California
——
201310–12 Sep 2013Monterey Conference Center
Costa Mesa, California
——
201211–13 Sep 2012Monterey Conference Center
Costa Mesa, California
——
201119–22 Sep 2011Monterey Conference Center
Costa Mesa, California
——
201013–16 Sep 2010Monterey Conference Center
Costa Mesa, California
——

Past editions from the bvents archive (2008–2019) and organiser figures where they were published.

Questions

When is SPIE Photomask Technology?

The next dates haven't been confirmed. The last edition we have on record was 29 Sep – 1 Oct 2015.

Where is it held?

The last edition we have was at Monterey Conference Center, Costa Mesa, California.

How often does it take place?

Annual, judging by the 6 editions on record since 2010.

Industries