Conference · Costa Mesa, California
SPIE Photomask Technology 2013
Electronics · Semiconductor · Engineering
Key numbers
- Editions on record
- 6first in 2010
About SPIE Photomask Technology
The 33rd Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the forum to present the newest findings, to discuss the most exciting trends, and to ponder reliable solutions in this rapidly developing industry and their effects on the semiconductor lithography.
Come to the mask-making industry's premier event, 10-11 September 2013, and meet with the key suppliers of components, software, and manufacturing equipment in the mask industry.
• Keynote Speaker
John Y. Chen
• list of exhibitors
Carl Zeiss SMS GmbH
Gudeng
Ibss Group, Inc.
Inko Industrial Corp.
Micro Lithography, Inc.
Pozzetta
RAVE LLC
and many more.
From our listing of this edition. Details may have changed since.
Editions
| Year | Dates | Where | Exhibitors | Visitors |
|---|---|---|---|---|
| 2015 | 29 Sep – 1 Oct 2015 | Monterey Conference Center Costa Mesa, California | — | — |
| 2014 | 16–18 Sep 2014 | Monterey Conference Center Costa Mesa, California | — | — |
| 2013 | 10–12 Sep 2013 | Monterey Conference Center Costa Mesa, California | — | — |
| 2012 | 11–13 Sep 2012 | Monterey Conference Center Costa Mesa, California | — | — |
| 2011 | 19–22 Sep 2011 | Monterey Conference Center Costa Mesa, California | — | — |
| 2010 | 13–16 Sep 2010 | Monterey Conference Center Costa Mesa, California | — | — |
Past editions from the bvents archive (2008–2019) and organiser figures where they were published.