Conference · Costa Mesa, California
SPIE Photomask Technology 2012
Electronics · Semiconductor · Engineering
Key numbers
- Editions on record
- 6first in 2010
About SPIE Photomask Technology
In 2012, masks will continue to be the key differentiating elements in optical lithography as well as enabling EUV lithography. Further, our mask industry will be challenged to extend optical lithography yet one more node while much effort and resources are focused on the EUV promise. As mask makers, once again we need to excel at EUV, double patterning, ILT, NIL, and all the other varieties of photolithography. More and more we see the Litho error budget putting more burden to the mask. In a way the mask is an enabler, but also contains an increasing list of challenges.
The 32nd Annual Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the forum to present the newest findings, to discuss the most exciting trends, to ponder reliable solutions in this rapidly developing industry, and their effects on the semiconductor lithography.
From our listing of this edition. Details may have changed since.
Editions
| Year | Dates | Where | Exhibitors | Visitors |
|---|---|---|---|---|
| 2015 | 29 Sep – 1 Oct 2015 | Monterey Conference Center Costa Mesa, California | — | — |
| 2014 | 16–18 Sep 2014 | Monterey Conference Center Costa Mesa, California | — | — |
| 2013 | 10–12 Sep 2013 | Monterey Conference Center Costa Mesa, California | — | — |
| 2012 | 11–13 Sep 2012 | Monterey Conference Center Costa Mesa, California | — | — |
| 2011 | 19–22 Sep 2011 | Monterey Conference Center Costa Mesa, California | — | — |
| 2010 | 13–16 Sep 2010 | Monterey Conference Center Costa Mesa, California | — | — |
Past editions from the bvents archive (2008–2019) and organiser figures where they were published.