Expo and conference · San Jose, California
SPIE Advanced Lithography 2011
Optics, Precision Mechanics, Laser · Semiconductor
Key numbers
- Editions on record
- 7first in 2010
About SPIE Advanced Lithography
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography
SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Resist Materials and Processing Technology
+ Optical Microlithography
+ Design for Manufacturability through Design-Process Integration
From our listing of this edition. Details may have changed since.
Editions
| Year | Dates | Where | Exhibitors | Visitors |
|---|---|---|---|---|
| 2018 | 25 Feb – 1 Mar 2018 | San Jose Convention Center San Jose, California | — | — |
| 2016 | 21–25 Feb 2016 | San Jose Marriott Hotel San Jose, California | — | — |
| 2015 | 22–26 Feb 2015 | San Jose Convention Center San Jose, California | — | — |
| 2014 | 23–27 Feb 2014 | San Jose Convention Center San Jose, California | — | — |
| 2012 | 12–16 Feb 2012 | San Jose Convention Center San Jose, California | — | — |
| 2011 | 27 Feb – 4 Mar 2011 | San Jose Convention Center San Jose, California | — | — |
| 2010 | 21–26 Feb 2010 | San Jose Convention Center San Jose, California | — | — |
Past editions from the bvents archive (2008–2019) and organiser figures where they were published.