Expo and conference · San Jose, California

SPIE Advanced Lithography 2010

Optics, Precision Mechanics, Laser · Semiconductor

Official website
Dates21–26 Feb 2010This edition has ended
VenueSan Jose Convention CenterSan Jose, California
RunningSince 2010Irregular · 7 editions on record
Last checked11 Nov 2026Organiser website checked
This is the 2010 edition. It has ended. See SPIE Advanced Lithography's current page for the next dates.

Key numbers

Editions on record
7first in 2010

About SPIE Advanced Lithography

EUV—sources, components, yields, resists, modeling
• Alternative Technologies—maskless, nano-imprint, directed self-assembly
• Optical lithography—computational, double patterning, SMO, OPC, RET
• Metrology, inspection, process control, LER/LWR, mask litho, DBM

From our listing of this edition. Details may have changed since.

Editions

YearDatesWhereExhibitorsVisitors
201825 Feb – 1 Mar 2018San Jose Convention Center
San Jose, California
——
201621–25 Feb 2016San Jose Marriott Hotel
San Jose, California
——
201522–26 Feb 2015San Jose Convention Center
San Jose, California
——
201423–27 Feb 2014San Jose Convention Center
San Jose, California
——
201212–16 Feb 2012San Jose Convention Center
San Jose, California
——
201127 Feb – 4 Mar 2011San Jose Convention Center
San Jose, California
——
201021–26 Feb 2010San Jose Convention Center
San Jose, California
——

Past editions from the bvents archive (2008–2019) and organiser figures where they were published.

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